Silicide - Wikipedia A silicide is a type of chemical compound that combines silicon and a usually more electropositive element Silicon is more electropositive than carbon In terms of their physical properties, silicides are structurally closer to borides than to carbides
Silicide - an overview | ScienceDirect Topics A silicide, in the broadest definition, is a compound formed between silicon and any other element in the periodic table However, in the context of "inte-rmetallics", a silicide is an intermetallic compound formed between a metal species and silicon, and with specific ratios of the two species
Silicide - an overview | ScienceDirect Topics A silicide film is formed by the deposition of a metal thin film on a Si substrate and the solid-phase reaction with post-deposition annealing (PDA) Silicide is only formed between metal and Si on poly-Si gates and on S D contacts where metal comes directly into contact with Si
Silicides and Silicidation Equation 2036b forms a silicide, resulting in electrical short failure Some silicides can cause problems in IC devices For instance, copper migrating into silicon active areas can form copper silicide precipitates resulting in leakage current at source and drain shallow junctions
PROPERTIES AND APPLICATIONS OF SILICIDES - Springer Silicide-related studies have primarily focused on the investigation of fundamental properties such as electrical resistivity, high-temperature stability, and corrosion resistance, as well as the silicide
Silicides: Fundamentals and Applications | The Science and Culture . . . Silicide formation in systems based on dense silicon nitride and non-nitride forming metals can be explained by assuming a nitrogen pressure build-up at the contact surface This pressure determines the chemical potential of Si at the interface and, hence, the product phases in the diffusion zone
Silicides: Promising Thermoelectrics - MilliporeSigma The most efficient thermoelectric material among all transition metal silicides is higher manganese silicide It has a figure of merit significantly lower than that of Mg 2 Si-based materials, but is still in the region of ZT ~ 0 9 at 870 K
Silicide - an overview | ScienceDirect Topics The thinner Ni silicide exhibits smoother silicide–Si interface than the thicker ones The Ni:Si ratio of the 16 nm-thick silicide is very close to 1:2, as determined from EDX, confirming that the formed phase is NiSi 2, whereas the 5 nm-thick silicide is too thin for the EDX analysis